| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter for obtaining a colored pattern of higher resolution in comparison with a conventional method while keeping or lowering resolution required for a patterning method. <P>SOLUTION: The method of manufacturing the color filter includes the steps of: forming a first checkered colored pattern on a support; forming a second checkered colored patten in the region, where the first colored pattern is not formed, on the support; forming photoresist layers on the first and second colored patterns; processing the photoresist layers on the first and second colored patterns respectively into checkered patterns with half size of the respective colored patterns by exposure and development; dry etching the first and second colored patters by using the processed photoresist layers as masking; removing the photoresist layers after etching; and forming a third checkered colored pattern in the region, where the first and second colored pattern are not formed, on the support. <P>COPYRIGHT: (C)2010,JPO&INPIT |
