发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, provided with a sealing ring having a function as a barrier against moisture infiltration from the cut plane of dicing and against crack extensions by optimizing a seal-ring structure. SOLUTION: The seal ring 100 is disposed between a circuit forming region on a semiconductor substrate 1 and a dicing region. The seal ring 100 includes a part with stacked seal layers, having T-shape cross sections and a part with stacked seal layers having rectangular cross sections. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010206226(A) 申请公布日期 2010.09.16
申请号 JP20100140172 申请日期 2010.06.21
申请人 RENESAS ELECTRONICS CORP 发明人 MORIMOTO NOBORU;FUJISAWA MASAHIKO;KODAMA DAISUKE
分类号 H01L21/3205;H01L23/52 主分类号 H01L21/3205
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