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发明名称
Device for forming pattern large area using electron beam And Controlling method for the same
摘要
申请公布号
KR100982529(B1)
申请公布日期
2010.09.16
申请号
KR20080083370
申请日期
2008.08.26
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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