| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for optical nanoimprint lithography with a superior removing property for a photocured body, a method of forming a resist pattern, a microstructure, and a method of removing the photocured body. SOLUTION: The photosensitive resin composition for optical nanoimprint lithography contains a photopolymerizable compound (A) and a photopoymerization initiator (B). The photopoymerization initiator (B) contains a compound producing active species when irradiated with a first active light beam, and the photopolymerizable compound (A) contains a compound containing, in a molecule, two or more polymerizable groups and a characteristic group containing a bond disconnected when irradiated with a second active light beam having a shorter wavelength than the first active light beam. COPYRIGHT: (C)2010,JPO&INPIT
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