发明名称 METHOD OF MANUFACTURING COLOR FILTER AND SOLID STATE IMAGING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of inexpensively manufacturing a color filter having superior color reproducibility by restraining color mixture. SOLUTION: In this method, a device protective layer 36 is formed on a chip substrate 12a. A recessed part 37 is formed on the device protective layer 36. A porous silica layer 74 is formed on the device protective layer 36 to fill in the recessed part 37. Green/blue/red openings 76R, 76G, 76B are formed in order in the porous silica layer 74, and green/blue/red layers 83G, 83B, 83R corresponding to the colors of the openings are stacked in order on the porous silica layer 74 to fill in the opening every time each opening is formed. The respective surfaces of the respective color layers 83R, 83B, 83G and the porous silica layer 74 are subjected to polishing until a polishing stopper part 38, which is a peripheral edge part of the recessed part 37, is exposed, thereby forming a color filter 22 including the respective color pixels 40R, 40G, 40B and separation walls 41. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010204154(A) 申请公布日期 2010.09.16
申请号 JP20090046487 申请日期 2009.02.27
申请人 FUJIFILM CORP 发明人 YOSHIBAYASHI KOJI;KIKUCHI TOMOYUKI
分类号 G02B5/20;H01L27/14 主分类号 G02B5/20
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