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发明名称
Verfahren zur Herstellung eines Halbleiterbauelements mit Isolationsgraben mit reduzierter Seitenwandverspannung
摘要
申请公布号
DE102005063129(B4)
申请公布日期
2010.09.16
申请号
DE200510063129
申请日期
2005.12.30
申请人
ADVANCED MICRO DEVICES INC.
发明人
HEMPEL, KLAUS;KRUEGEL, STEPHAN;PRUEFER, EKKEHARD
分类号
H01L21/762;H01L21/311
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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