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发明名称
ATOMIC LAYER DEPOSITION APPARATUS
摘要
申请公布号
KR100982842(B1)
申请公布日期
2010.09.16
申请号
KR20080038692
申请日期
2008.04.25
申请人
发明人
分类号
C23C16/455;C23C16/00
主分类号
C23C16/455
代理机构
代理人
主权项
地址
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