发明名称 POLISHING TAPE
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing tape that is unwound from a wound state without causing undulation. <P>SOLUTION: The polishing tape 10 includes a belt-like urethane sheet 2 that has a polishing surface P for polishing an object to be polished. The urethane sheet 2 is formed by a wet film forming method. The urethane sheet 2 has a skin layer 2a on the polishing surface P side in which dense micropores are formed. A number of cells 3 are formed in an inner side of the skin layer 2a of the urethane sheet 2 so as to be dispersed approximately uniformly. The urethane sheet 2 has continuous formed structure. The polishing tape 10 has a belt-like base material 6 bonded to the opposite surface of the polishing surface P of the urethane sheet 2. A rear surface S of the base material 6 is roughened by sand blast processing. A localized adhesion between the polishing surface P and the rear surface S is suppressed. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010201558(A) 申请公布日期 2010.09.16
申请号 JP20090049650 申请日期 2009.03.03
申请人 FUJIBO HOLDINGS INC 发明人 MATSUMURA YASUSHI;TAKAGI MASATAKA
分类号 B24B21/00;B24B37/00;B24B37/20 主分类号 B24B21/00
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