发明名称 PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED PRODUCT HAVING SURFACE MICROPATTERN
摘要 PROBLEM TO BE SOLVED: To provide a photocurable composition which forms a cured product having excellent environmental properties and mold release performance and has excellent compatibility with fluorosurfactants and other components, and also to provide a production method thereof by which a molded product, having a surface micropattern precisely transferred from an inverted pattern of a mold and a uniform surface composition, is produced. SOLUTION: A photocurable composition for imprinting comprises a compound having one or more acryloyloxy (or methacryloyloxy) groups as a primary component, and contains the following polymer (D). The polymer (D) contains 20 to 45 mass% of CH<SB>2</SB>=C(R<SP>11</SP>)-C(O)O-Q-R<SP>f</SP>units, 20 to 65 mass% of CH<SB>2</SB>=C(R<SP>21</SP>)-C(O)O-(CH<SB>2</SB>CH(R<SP>22</SP>)O)<SB>n</SB>-H units (number-average molecular weight of 350 or less), 5 to 40 mass% of CH<SB>2</SB>=C(R<SP>31</SP>)-C(O)O-R<SP>32</SP>units, and has a mass-average molecular weight of 1,000 to 5,000, wherein R<SP>11</SP>, R<SP>21</SP>, and R<SP>31</SP>are hydrogen atoms or methyl groups, Q is a bivalent linking group or the like, R<SP>f</SP>is a C1-6 polyfluoroalkyl group or the like, R<SP>22</SP>is a hydrogen atom or the like, n is any of the numbers 3-6, and R<SP>32</SP>is a C2-15 aliphatic hydrocarbon group. COPYRIGHT: (C)2010,JPO&amp;INPIT
申请公布号 JP2010206189(A) 申请公布日期 2010.09.16
申请号 JP20100023491 申请日期 2010.02.04
申请人 AGC SEIMI CHEMICAL CO LTD;ASAHI GLASS CO LTD 发明人 FUJIE AYAKO;KAWAGUCHI YASUHIDE;NONAKA FUMIKO
分类号 H01L21/027;C08F2/44;C08F2/48;C08F220/28;C08F265/06 主分类号 H01L21/027
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