HEAT TREATMENT APPARATUS OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a heat treatment apparatus of a substrate which can promptly heat the whole substrate such as glass substrate to a treatment temperature. SOLUTION: The heat treatment apparatus of the substrate is formed by arranging a heat absorbing fin 14 which absorbs radiant heat between the center of a glass substrate W held by a boat 7 carried in or out of a process tube 4 from a furnace opening 6 of a heat treatment furnace 2 and a heat shield plate 13a which insulates the radiant heat caused by a heater 5 arranged outside the process tube 4. COPYRIGHT: (C)2010,JPO&INPIT