FIELD FACET MIRROR FOR USE IN AN ILLUMINATION OPTICS OF A PROJECTION EXPOSURE APPARATUS FOR EUV MICROLITHOGRAPHY

摘要

A field facet mirror serves for use in an illumination optics of a projection exposure apparatus for EUV microlithography for transmitting a structure of an object arranged in an object field into an image field. The field facet mirror (6) has a plurality of field facets (18X) with reflection surfaces (22). The arrangement of the field facets (18X) next to one another spans a base plane (xy). Projections of the reflection surfaces (22) of at least two of the field facets (18X) onto the base plane (x, y) differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results, in which the ensuring of a uniform object field illumination with a simultaneously high EUV throughput meets high requirements.