发明名称 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD
摘要 A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R1 represents a hydrogen atom or an electron-donating group, at least one R1 is an electron-donating group, R2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R3 represents an alkyl group having 1 to 8 carbon atoms, and R4 represents a monovalent organic group.
申请公布号 US2010233632(A1) 申请公布日期 2010.09.16
申请号 US20100722529 申请日期 2010.03.12
申请人 JSR CORPORATION 发明人 KAWAZU TOMOHARU;TANAKA MASATO;MORI TAKASHI;TAKANASHI KAZUNORI;YASUDA KYOYU
分类号 G03F7/20;C08L83/04 主分类号 G03F7/20
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