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发明名称
Verfahren zum Ausbilden einer Halbleiterstruktur mit Bemustern einer Schicht aus einem Material
摘要
申请公布号
DE102005004410(B4)
申请公布日期
2010.09.16
申请号
DE200510004410
申请日期
2005.01.31
申请人
ADVANCED MICRO DEVICES INC.
发明人
FROHBERG, KAI;MAZUR, MARTIN;RUELKE, HARTMUT
分类号
H01L21/336;G03F7/004;G03F7/20;H01L21/311
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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