| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for correcting misalignment of the optical axis of a beam even when the beam is turned ON/OFF by a blanker at a high speed. SOLUTION: A lithography system 100 includes an XY stage 105, an electron gun 201 which emits the electron beam 200 to the stage side, a blanking aperture 214, the blanker 212 which has a terminating resistor at an electrode for blanking so as to suppress voltage reflection, and applies a prescribed voltage to the electrode to deflect the electron beam passing by the electrode onto the blanking aperture 214, an alignment coil 216 for correcting misalignment of the optical axis of the electron beam caused when the beam is turned ON/OFF by repeatedly applying the voltage to the blanker 212, and an alignment coil control circuit 130 which controls the alignment coil 216 so as to correct an optical axis misalignment amount. COPYRIGHT: (C)2010,JPO&INPIT
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