发明名称 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
申请公布号 US2010233596(A1) 申请公布日期 2010.09.16
申请号 US20070438098 申请日期 2007.08.14
申请人 SHOWA DENKO K.K. 发明人 IKEDA HARUHIKO;MIYATA HIDEO;HATTORI YOTARO;MUROFUSHI KATSUMI
分类号 G03F1/00;C07C333/04;G03F7/004 主分类号 G03F1/00
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