发明名称 |
LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
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申请公布号 |
US2010233600(A1) |
申请公布日期 |
2010.09.16 |
申请号 |
US20100722955 |
申请日期 |
2010.03.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;MACHT LUKASZ JERZY |
分类号 |
G03F7/20;G01B11/14;G03B27/54 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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