发明名称 LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
申请公布号 US2010233600(A1) 申请公布日期 2010.09.16
申请号 US20100722955 申请日期 2010.03.12
申请人 ASML NETHERLANDS B.V. 发明人 DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;MACHT LUKASZ JERZY
分类号 G03F7/20;G01B11/14;G03B27/54 主分类号 G03F7/20
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