发明名称
摘要 PROBLEM TO BE SOLVED: To provide a method with which a Gaussian type distribution apodization is surely given with high accuracy by a two-luminous flux interferometric method for manufacturing the optical waveguide Bragg grating and to provide an apparatus of manufacturing an optical waveguide Bragg grating. SOLUTION: In a configuration in which an ultraviolet laser light beam 5 is divided into two beams, the beams are reflected on two mirrors 2 and made interfered by superposing at the position of an optical waveguide 4, the two beams are strongly interfered at the central part of the optical waveguide Bragg grating by superposing by crossing diffraction grating images at the position of the optical waveguide by symmetrically turning the two mirrors byαfrom an angle at which two mirrors are in parallel to each other, and the two beams weakly or not at all interfere at end parts, thus the apodization is given to the optical waveguide Bragg grating. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP4543128(B2) 申请公布日期 2010.09.15
申请号 JP20040288086 申请日期 2004.09.30
申请人 发明人
分类号 G02B6/12;G02B6/02;G02B6/13 主分类号 G02B6/12
代理机构 代理人
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