摘要 |
PROBLEM TO BE SOLVED: To provide a method with which a Gaussian type distribution apodization is surely given with high accuracy by a two-luminous flux interferometric method for manufacturing the optical waveguide Bragg grating and to provide an apparatus of manufacturing an optical waveguide Bragg grating. SOLUTION: In a configuration in which an ultraviolet laser light beam 5 is divided into two beams, the beams are reflected on two mirrors 2 and made interfered by superposing at the position of an optical waveguide 4, the two beams are strongly interfered at the central part of the optical waveguide Bragg grating by superposing by crossing diffraction grating images at the position of the optical waveguide by symmetrically turning the two mirrors byαfrom an angle at which two mirrors are in parallel to each other, and the two beams weakly or not at all interfere at end parts, thus the apodization is given to the optical waveguide Bragg grating. COPYRIGHT: (C)2006,JPO&NCIPI |