| 摘要 |
An active matrix substrate includes: pixel regions (5L, 5R, and 5M) provided in line and column direction; scan signal lines (16± and 16²); data signal lines (Sp, Sq, sp, and sq) crossing the scan signal lines at right angles; a gate insulating film covering the scan signal lines; and an interlayer insulating film covering the data signal lines, two of the data signal lines (Sq and sp) being provided (i) so as to overlap a gap between two of the pixel regions (5L and 5R) which are adjacent to each other in the line direction or (ii) so as to overlap a region which extends along the gap, the interlayer insulating film having a hollow part K so that the hollow part K and a gap between the two of the data signal lines (Sq and sp) overlap each other, and part of the hollow part K and the scan signal lines (16± and 16²) overlap each other via the gate insulating film. The configuration allows an active matrix substrate including two data signal lines provided in a gap between two adjacent pixel regions to fix short circuit without exposing data signal lines or scan signal lines even when two data signal lines short-circuit on scan signal lines due to a residue.
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