LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND RESIST COATING METHOD

摘要

PURPOSE: A liquid processing apparatus, a liquid processing method, and a method for applying a resist are provided to suppress the re-attach of mist generated from liquid on a substrate by scattering the mist from the liquid to the outside. CONSTITUTION: An inner cup(40) is located on the lower side of a wafer(W). The wafer is supported by a spin chuck(31). The inner cup is composed of a ring shape slant wall(41) and a vertical wall(42). A protrusion wall(43) is formed into a ring shape on the top part of the inner cup. A middle cup(50) surrounds the external side of the inner cup. An outer cup(60) is composed of a cylindrical forming part(60a) and a slant wall(61).