发明名称 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION
摘要 An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
申请公布号 KR20100100781(A) 申请公布日期 2010.09.15
申请号 KR20107010271 申请日期 2008.10.11
申请人 CARL ZEISS SMT AG 发明人 MANN HANS JURGEN;ULRICH WILHELM;MULLENDER STEPHAN;ENKISCH HARTMUT
分类号 G03F7/20;B81C99/00 主分类号 G03F7/20
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