发明名称 |
Level sensor arrangement for lithographic apparatus and device manufacturing method |
摘要 |
<p>Level sensor arrangement for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.</p> |
申请公布号 |
EP2228685(A2) |
申请公布日期 |
2010.09.15 |
申请号 |
EP20100154577 |
申请日期 |
2010.02.24 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF, ARIE;BENSCHOP, JOZEF;BRINKHOF, RALPH;MACHT, LUKASZ |
分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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