发明名称 FABRICATION METHOD OF X-RAY WAVEGUIDES USING PLASNOMIC LIGHT
摘要 <p>PURPOSE: A manufacturing method of x-ray waveguides using plasmonic light is provided to manufacture a core of the X-rays waveguide by using a nano channel. CONSTITUTION: A nano wire pattern mask for a photolithography manufactures the core of X-rays wave guide. The nano wire pattern mask has the line width of nano millimeters and the length of millimeters. A dielectric nano thin film(10) is evaporated between a metallic foil(20). The nano wire pattern mask uses abnormal light guiding mode through a plasmon.</p>
申请公布号 KR20100100199(A) 申请公布日期 2010.09.15
申请号 KR20090018948 申请日期 2009.03.05
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, DANKOOKUNIVERSITY 发明人 CHOI, JAE HO
分类号 G02B6/13;B82Y40/00;G03F1/50;H01L21/027 主分类号 G02B6/13
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