发明名称 |
FABRICATION METHOD OF X-RAY WAVEGUIDES USING PLASNOMIC LIGHT |
摘要 |
<p>PURPOSE: A manufacturing method of x-ray waveguides using plasmonic light is provided to manufacture a core of the X-rays waveguide by using a nano channel. CONSTITUTION: A nano wire pattern mask for a photolithography manufactures the core of X-rays wave guide. The nano wire pattern mask has the line width of nano millimeters and the length of millimeters. A dielectric nano thin film(10) is evaporated between a metallic foil(20). The nano wire pattern mask uses abnormal light guiding mode through a plasmon.</p> |
申请公布号 |
KR20100100199(A) |
申请公布日期 |
2010.09.15 |
申请号 |
KR20090018948 |
申请日期 |
2009.03.05 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, DANKOOKUNIVERSITY |
发明人 |
CHOI, JAE HO |
分类号 |
G02B6/13;B82Y40/00;G03F1/50;H01L21/027 |
主分类号 |
G02B6/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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