发明名称 Aberration measurement apparatus and aberration measurement method
摘要 An aberration measurement apparatus measures the aberration of an imaging optical system. The apparatus includes an illumination system, a separation member, and a measurement unit. The illumination system supplies the imaging optical system with measurement light used to measure an aberration of the imaging optical system and background light different from the measurement light. The separation member separates the measurement light and the background light which have passed through the imaging optical system. The measurement unit measures the aberration of the imaging optical system on the basis of the measurement light separated by the separation member.
申请公布号 US7796245(B2) 申请公布日期 2010.09.14
申请号 US20080043657 申请日期 2008.03.06
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. 发明人 TANIGUCHI YUKIO
分类号 G01J1/00 主分类号 G01J1/00
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