发明名称 |
Chemically amplified positive resist composition |
摘要 |
The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.
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申请公布号 |
US7794914(B2) |
申请公布日期 |
2010.09.14 |
申请号 |
US20070705138 |
申请日期 |
2007.02.12 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ANDO NOBUO;FUJI YUSUKE;TAKEMOTO ICHIKI |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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