| 摘要 |
<p>The present disclosure relates to compositions and methods for cleaning and polishing dentures during denture fabrication. The stone cast used to make the denture is soaked in a dissolution composition bath for a period of time, which removes the stone cast. The denture is then polished with a solvent composition, where the solvent composition includes an active solvent with low solubility toward acrylics such as polymethyl methylacrylate (PMMA), and a carrier solvent with no solubility toward acrylics. As an alternative to the solvent composition, the denture can be recovered from the stone cast and polished with a device having a robotic arm, with a substrate having a pumice stone slurry.</p> |
