发明名称 Nitride semiconductor device
摘要 A nitride semiconductor device with a p electrode having no resistance between itself and other electrodes, and a method of manufacturing the same are provided. A p electrode is formed of a first Pd film, a Ta film, and a second Pd film, and on a p-type contact layer of a nitride semiconductor. On the second Pd film, a pad electrode is formed. The second Pd film is formed on the entire upper surface of the Ta film which forms part of the p electrode, and serves as an antioxidant film that prevents oxidation of the Ta film. Preventing oxidation of the Ta film, the second Pd film can reduce the resistance that may exist between the p electrode and the pad electrode, thereby preventing a failure in contact between the p electrode and the pad electrode and providing the p electrode with low resistance.
申请公布号 US7795738(B2) 申请公布日期 2010.09.14
申请号 US20080327874 申请日期 2008.12.04
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 SHIOZAWA KATSUOMI;KANAMOTO KYOZO;KUROKAWA HIROSHI;TOKUDA YASUNORI;KURAMOTO KYOSUKE;SAKUMA HITOSHI
分类号 H01L29/45;H01L21/20;H01L21/28;H01L21/338;H01L29/812;H01L33/32;H01L33/36;H01L33/40;H01S5/042;H01S5/323 主分类号 H01L29/45
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