发明名称 Semiconductor laser
摘要 A GaN laser, includes a coating film on a front end surface through which laser light is emitted. The coating film includes a first insulating film in contact with the front end surface and a second insulating film on the first insulating film. The optical film thickness of the second insulating film is an odd multiple of λ/4 with respect to the wavelength λ of laser light produced by the semiconductor laser. The adhesion of the first insulating film to GaN is stronger than the adhesion of the second insulating film to GaN. The refractive index of the second insulating film is 2 to 2.3 thick. The first insulating film is 10 nm or less. The first insulating film is an oxide film having a stoichiometric composition.
申请公布号 US7796664(B2) 申请公布日期 2010.09.14
申请号 US20090348061 申请日期 2009.01.02
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 NAKAGAWA YASUYUKI;NISHIGUCHI HARUMI;KURAMOTO KYOSUKE;KUSUNOKI MASATSUGU;SHIRAHAMA TAKEO;SUZUKI YOSUKE;MATSUOKA HIROMASU
分类号 H01S5/00 主分类号 H01S5/00
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