| 摘要 |
The invention relates to a thin film transistor substrate for use in a liquid crystal display device and a method of fabricating the same, and an object is to provide a thin film transistor substrate which can ensure high reliability even though a low resistance metal is used in a material for a gate electrode and a predetermined wiring and a method of fabricating the same. A TFT substrate has a gate electrode in a multilayer structure configured of an AlN film as a nitrogen containing layer, an Al film as a main wiring layer and an upper wiring layer formed of an MoN film and an Mo film. On the gate electrode whose side surface inclines gently, a gate insulating film of excellent film quality is formed.
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