发明名称 Silicon carbide single crystal, silicon carbide single crystal wafer, and method of production of same
摘要 The present invention provides a high resistivity, high quality, large size SiC single crystal, SiC single crystal wafer, and method of production of the same, that is, a silicon carbide single crystal containing uncompensated impurities in an atomic number density of 1 ×1015/cm3 or more and containing vanadium in an amount less than said uncompensated impurity concentration, silicon carbide single crystal wafer obtained by processing and polishing the silicon carbide single crystal and having an electrical resistivity at room temperature of 5×103 &OHgr;cm or more, and a method of production of a silicon carbide single crystal.
申请公布号 US7794842(B2) 申请公布日期 2010.09.14
申请号 US20040589680 申请日期 2004.12.27
申请人 NIPPON STEEL CORPORATION 发明人 NAKABAYASHI MASASHI;FUJIMOTO TATSUO;SAWAMURA MITSURU;OHTANI NOBORU
分类号 B32B9/04;B32B9/00;B32B13/04;B32B19/00;C04B35/52;C04B35/56 主分类号 B32B9/04
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