发明名称 |
SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD |
摘要 |
<p>PURPOSE: A device and a method for transferring a substrate are provided to improve the throughput of a substrate processing system by reducing a transfer time of a substrate between a processing device and a substrate receiving unit. CONSTITUTION: A first substrate receiver(50) receives a plurality of substrates(W) inputted to a processing device(22) in a vertical direction with multi-stages. A second substrate receiver(51) receives a plurality of substrates outputted from the processing device in the vertical direction with multi-stages. A first substrate holder(56) transfers the substrate from the first substrate receiver to the processing device. A second substrate holder(57) transfers the substrate from the processing device to the second substrate receiver. A first lifting unit(42a) transfers the substrate between the first substrate receiver and the first substrate holder by vertically moving the first substrate holder and the substrate in the first substrate receiver. A second lifting unit(42b) transfers the substrate between the second substrate receiver and the second substrate holder by vertically moving the second substrate holder and the substrate in the second substrate receiver.</p> |
申请公布号 |
KR20100099654(A) |
申请公布日期 |
2010.09.13 |
申请号 |
KR20100014954 |
申请日期 |
2010.02.19 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SAKAUE HIROMITSU;YAMAGUCHI HIROFUMI |
分类号 |
H01L21/677;B65G49/07;H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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