| 摘要 |
<p>FIELD: process engineering. ^ SUBSTANCE: proposed invention is intended for gas treatment. Proposed device comprises casing, flexible filtration layer dividing casing inner space into inlet and outlet chambers and incorporates gas passage section, inlet channel communicated with inlet chamber and generating gas for inlet chamber, outlet channel communicated with outlet chamber and directing gas fed from inlet chamber into outlet chamber via filtration layer. Note here that outlet channel has an opening and section limiting displacement of gas passage section of aforesaid filtration layer nearby aforesaid opening in direction toward said opening. Note also that displacement limiting section is located only nearby section gas passage part nearby aforesaid opening. ^ EFFECT: ruling out of flow resistance caused by displacement of filtration layer and has pulsation. ^ 10 cl, 7 dwg</p> |
