发明名称 GATE VALVE ASSEMBLY AND SUBSTRATE-PROCESSING SYSTEM COMPRISING SAME
摘要 The present invention relates to a gate valve assembly comprising: a valve chamber interposed between a first chamber and a second chamber having respective substrate inlet / outlet ports; a pair of gate valves arranged in the valve chamber to open / shut the respective substrate inlet / outlet ports of the first chamber and the second chamber; and a gate valve support unit which supports the pair of gate valves such that the pair of gate valves move in the upward and downward directions, and move linearly between the shut position for shutting the substrate inlet / outlet ports and the open position for opening the substrate inlet / outlet ports. The thus-configured gate valve assembly effectively opens / shuts the substrate inlet / outlet ports of a substrate-processing system.
申请公布号 WO2010101413(A2) 申请公布日期 2010.09.10
申请号 WO2010KR01331 申请日期 2010.03.03
申请人 NEW PWER PLASMA CO., LTD.;WI, SOON-IM;JO, MI RA 发明人 WI, SOON-IM;JO, MI RA
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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