发明名称 PHOTOSENSITIVE POLYORGANOSILOXANE COMPOSITION
摘要 <p>Disclosed is a photosensitive polyorganosiloxane composition comprising component (a): 100 parts by mass of a polyorganosiloxane wherein the polyorganosiloxane has been obtained by mixing a silanol compound represented by general formula (1): R2Si(OH)2, an alkoxysilane compound represented by general formula (2): R'Si(OR'')3, and an alkoxysilane compound represented by general formula (3): R'''Si(OR'''')3 in a specific molar ratio range with a catalyst selected from the group consisting of metal alkoxides represented by general formula (4): M(OR''''')4, metal alkoxides represented by general formula (5): M'(OR'''''')3, and Ba(OH)2 and polymerizing the mixture without the addition of water, and component (b): 0.1 to 20 parts by mass of a photopolymerization initiator. The groups in the general formulae (1) to (5) are as defined in the claims.</p>
申请公布号 KR20100099317(A) 申请公布日期 2010.09.10
申请号 KR20107016321 申请日期 2009.03.06
申请人 ASAHI KASEI E-MATERIALS CORPORATION 发明人 KIMURA MASASHI;HIRATA TATSUYA
分类号 G03F7/075;G03F7/004;H01L21/027 主分类号 G03F7/075
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