发明名称 |
BUMP, METHOD FOR FORMING BUMP, AND METHOD FOR MOUNTING SUBSTRATE HAVING THE BUMP FORMED THEREON |
摘要 |
Disclosed is a bump which has a double-layered structure comprising a first bump layer and a second bump layer, wherein the first bump layer is formed on a substrate and comprises a bulk of a first electrically conductive metal selected from gold, copper and nickel, and the second bump layer is formed on the first bump layer and comprises a sintered body of a powder of a second electrically conductive metal selected from gold and silver. The bulk that constitutes the first bump layer is formed by any one technique selected from a plating technique, a sputtering technique and a CVD technique. The sintered body that constitutes the second bump layer is formed by sintering a metal powder comprising the second electrically conductive metal, wherein the metal powder has a purity of 99.9% by weight or more and an average particle diameter of 0.005 to 1.0 µm. The second bump layer has a Young's modulus 0.1 to 0.4 time lower than that of the first bump layer. |
申请公布号 |
WO2010101236(A1) |
申请公布日期 |
2010.09.10 |
申请号 |
WO2010JP53615 |
申请日期 |
2010.03.05 |
申请人 |
TANAKA KIKINZOKU KOGYO K.K.;OGASHIWA, TOSHINORI;MIYAIRI, MASAYUKI |
发明人 |
OGASHIWA, TOSHINORI;MIYAIRI, MASAYUKI |
分类号 |
H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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