发明名称 MOS-GATED POWER DEVICES, METHODS, AND INTEGRATED CIRCUITS
摘要 MOS-gated devices, related methods, and systems for vertical power and RF devices including an insulated trench and a gate electrode. A body region is positioned so that a voltage bias on the gate electrode will cause an inversion layer in the body region. Permanent electrostatic charges are included in said insulation material. A conductive shield layer is positioned above the insulated trench, to reduce parasitic capacitances.
申请公布号 WO2010065428(A3) 申请公布日期 2010.09.10
申请号 WO2009US66000 申请日期 2009.11.25
申请人 DARWISH, MOHAMED, N.;ZENG, JUN;MAXPOWER SEMICONDUCTOR INC. 发明人 DARWISH, MOHAMED, N.;ZENG, JUN
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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