发明名称 PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT OF THE COMPOSITION, AND METHOD OF PRODUCING INSULATING FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive insulating resin composition for suppressing warpage and extension of a substrate when an insulating film is formed and having excellent resolution, sensitivity, electric insulation and the like, to provide a cured product such as the insulating film formed by curing the composition and to provide a method for producing the insulating film. <P>SOLUTION: A photosensitive insulating resin composition contains (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010197996(A) 申请公布日期 2010.09.09
申请号 JP20090279870 申请日期 2009.12.09
申请人 JSR CORP 发明人 SASAKI HIROBUMI;ITO JUNJI
分类号 G03F7/038;C08K5/1525;C08K5/17;C08L25/18;C08L63/00;G03F7/004;G03F7/023;G03F7/38;G03F7/40 主分类号 G03F7/038
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