发明名称 ENVIRONMENTAL SYSTEM INCLUDING TRANSPORT REGION FOR IMMERSION LITHOGRAPHY APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an environmental system for controlling an environment in a gap between an optical assembly and a device, which includes a fluid barrier, an immersion fluid system, and a transport region, wherein the transport region captures an immersion fluid flown from the gap and prevents leakage of the fluid, and direct decompression suction which may cause deformation of the device and/or optical assemble is prevented from being used for the device. <P>SOLUTION: The fluid barrier 254 is positioned near the device and maintains the transport region near the gap. The immersion fluid system 252 delivers the immersion fluid 248 that fills the gap 246. The transport region transports at least a portion of the immersion fluid 248 that is near the fluid barrier 254 and the device, away from the device. The immersion fluid system 252 can include a fluid removal system 282 that is in fluid communication with the transport region 256. The transport region 256 can be made of porous material. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010199574(A) 申请公布日期 2010.09.09
申请号 JP20100026009 申请日期 2010.02.08
申请人 NIKON CORP 发明人 NOVAK THOMAS W;HAZELTON ANDREW J;WATSON DOUGLAS C
分类号 H01L21/027;G03B27/42;G03F;G03F7/20 主分类号 H01L21/027
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