发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus that prevents particles from being flown up due to a pressure gradient while suppressing a time needed for atmosphere release short. SOLUTION: When releasing a load lock chamber to an atmosphere by gas introduction from a feed pipe, the vacuum processing apparatus starts evacuating the load lock chamber using an exhaust pipe when the pressure in the load lock chamber rises up to predetermined first pressure, and stops the evacuation using the exhaust pipe when the pressure in the load lock chamber rises up to second pressure higher than the first pressure. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010199460(A) 申请公布日期 2010.09.09
申请号 JP20090045032 申请日期 2009.02.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ONO KAZUYUKI;TAKAHASHI MASAKAZU;KANZAKI NOBUHIKO;YAMAKI KEN
分类号 H01L21/02;H01L21/677 主分类号 H01L21/02
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