| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask for vapor deposition and a method of manufacturing the same by which passage holes for passing a vapor deposition material are precisely formed. Ž<P>SOLUTION: The method of manufacturing the mask for vapor deposition is carried out by forming photoresist films 12a, 12b through reflection preventing films 30A, 30B on both side surfaces of a metal thin film 10 and exposing them to form a pattern of the passage hole 10A-1 on the photoresist films 12a, 12b. In the exposure, an emitted light passed through the photoresist films 12a, 12b is absorbed by the reflection preventing films 30A, 30B before the emitted light reaches the surface or the back surface of the metal thin film 10 and the occurrence of halation is suppressed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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