发明名称 CHARGED PARTICLE BEAM PROCESSING
摘要 Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
申请公布号 US2010224592(A1) 申请公布日期 2010.09.09
申请号 US20100719619 申请日期 2010.03.08
申请人 FEI COMPANY 发明人 TOTH MILOS;YOUNG RICHARD J.;HENSTRA ALEXANDER;JONG ALAN FRANK DE;MULDERS JOHANNES JACOBUS LAMBERTUS
分类号 C23F1/00;C23C14/22;C23C16/44;H01J37/10;H01J37/147;H01J37/305 主分类号 C23F1/00
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