| 摘要 |
The invention relates to a method that inhibits the formation of a deposition layer on metal surfaces in liquid submersion in a process susceptible to deposition, e.g. in an enrichment process. In the method, anodic current is supplied to the metal surface (11) to be protected against deposition via an external power source (100) and a cathode (12) immersed in the liquid, producing in the composition of the deposition adhering to the metal surface a change causing the adherence of the deposition to the surface (11) to be substantially weakened or the formation of deposition on a clean surface (11) to be substantially retarded.
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