发明名称 |
SEMICONDUCTOR QUANTUM DOT AND METHOD OF FORMING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor quantum dot for maintaining the quality and shape of a nanostructure with high quality without causing a problem of a decrease in crystal quality resulting from the shape of a huge island, and a method of forming the same. <P>SOLUTION: The method of forming the semiconductor quantum dot forms the semiconductor quantum dot by a self-organizing mechanism, wherein a layer is formed at ≥1 ML/s (monolayer per second) as a crystal growing rate of the quantum dot D and/or a crystal growing speed of a buried layer L4. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010199414(A) |
申请公布日期 |
2010.09.09 |
申请号 |
JP20090044413 |
申请日期 |
2009.02.26 |
申请人 |
NATIONAL INSTITUTE OF INFORMATION & COMMUNICATIONTECHNOLOGY |
发明人 |
AKAHA KOICHI;YAMAMOTO NAOKATSU |
分类号 |
H01L21/203;B82B1/00;B82B3/00;H01L21/205;H01L33/06;H01S5/343 |
主分类号 |
H01L21/203 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|