发明名称 SEMICONDUCTOR QUANTUM DOT AND METHOD OF FORMING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor quantum dot for maintaining the quality and shape of a nanostructure with high quality without causing a problem of a decrease in crystal quality resulting from the shape of a huge island, and a method of forming the same. <P>SOLUTION: The method of forming the semiconductor quantum dot forms the semiconductor quantum dot by a self-organizing mechanism, wherein a layer is formed at &ge;1 ML/s (monolayer per second) as a crystal growing rate of the quantum dot D and/or a crystal growing speed of a buried layer L4. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010199414(A) 申请公布日期 2010.09.09
申请号 JP20090044413 申请日期 2009.02.26
申请人 NATIONAL INSTITUTE OF INFORMATION & COMMUNICATIONTECHNOLOGY 发明人 AKAHA KOICHI;YAMAMOTO NAOKATSU
分类号 H01L21/203;B82B1/00;B82B3/00;H01L21/205;H01L33/06;H01S5/343 主分类号 H01L21/203
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