| 摘要 |
PROBLEM TO BE SOLVED: To provide an interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structure. SOLUTION: The method aims at imaging test light emerging from a test object over a range of angles so as to interfere with reference light on a detector, wherein the test and reference light are derived from a common source, varying simultaneously an optical path length difference from the source to the detector between interfering portions of the test and reference light at a rate that depends on the angle at which the test light emerges from the test object for each of the angles and determining an angle-dependence of an optical property of the test object based on the interference between the test and reference light as the optical path length difference is varied for each of the angles. COPYRIGHT: (C)2010,JPO&INPIT |
