发明名称 MASK HAVING WAVE FORM ALONG CIRCUMFERENCE
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask provided with wave form along the circumference for eliminating gaps to the face surface, and setting more contact points with the face surface so as to prevent deviation of the mask or airborne droplet infection, and improve availability. <P>SOLUTION: The mask is provided with wave form along the circumference for preventing deviation of the mask due to move of muscles on the face, formation of pressure marks on the face, or coming-off of cosmetic. For preventing airborne droplet infection due to tight attachment to the skin of the face, or preventing glasses from clouding, the wave form is basically formed symmetrically in the right and the left from a center part above the nose up to the muscles around the mouth, and the jaw. Two waves, one being 35 mm long and 10 mm high, and the other, 25 mm long and 5 mm high, are formed from the center above the nose up to ear string upper parts. Two waves, one being 25 mm long, and 5 mm high, and the other 15 mm long and 2 mm high are formed from the center of the jaw to reach ear string lower parts, as a basis. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010194287(A) 申请公布日期 2010.09.09
申请号 JP20090072744 申请日期 2009.02.26
申请人 FUJISAWA TORU;ISHIKAWA HIDETAKE;SACRAS:KK;TOPMAN CO LTD 发明人 ISHIKAWA HIDETAKE;FUJISAWA TORU
分类号 A62B18/02 主分类号 A62B18/02
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