| 摘要 |
PROBLEM TO BE SOLVED: To determine actual position of a semiconductor wafer in a circular pocket of a rotation susceptor and if a error occurs, to detect and resolve the error and its cause, in a method of identifying improper position of the semiconductor wafer located in the pocket of the susceptor while heat treatment is performed in a processing chamber which is heated by a source of near infrared ray and which is penetrable to near infrared ray emission. SOLUTION: A method for positioning a pyrometer such that part of measuring spot detected by the pyrometer is located on the semiconductor wafer and the part of measuring spot is located outside the semiconductor wafer and on the rotation susceptor, wherein the improper position of the semiconductor wafer is eccentric position in the pocket of the rotation susceptor. COPYRIGHT: (C)2010,JPO&INPIT |
