| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of evaluating a multi-gradation photomask for evaluating multi-gradation photomask with image data accurately reflecting a resist pattern formed on an object to be transferred by the multi-gradation photomask using an actual transfer condition. <P>SOLUTION: The method of evaluating the multi-gradation photomask has a transfer pattern including a translucent region, a light shielding region, and a semi-translucent region by patterning of at least light shielding film formed on a transparent substrate. Space image data of the transfer pattern to be evaluated under an exposure condition is acquired, a threshold of a predetermined effective transmittance is determined for space image data, the space image data is binarized using the threshold, and the transfer pattern is evaluated using the binarized space image data. <P>COPYRIGHT: (C)2010,JPO&INPIT |
