发明名称 DONOR SUBSTRATE AND MANUFACTURING METHOD OF DISPLAY DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a donor substrate capable of precisely transferring a desired region of a transferring layer and a manufacturing method of a display device using the above substrate. <P>SOLUTION: The donor substrate 40 is provided with a light absorbing layer 42, a heat shielding layer 43, a convex structure 44 and a contamination preventing layer 45 laminated in this order on a base body 41. The contamination preventing layer 45 is provided with a first part 45A on an upper surface of the convex structure 44 and a second part 45B on an upper surface of the heat shielding layer 43, and the first part 45A and the second part 45B are divided. Since heat diffusion through the contamination preventing layer 45 is reduced to a great extent, a risk of an undesired region of the transferring layer 50 being transferred becomes little and a desired region can be precisely transferred. The convex structure 44 is preferred to have a cross section of a reveresed-taper shape. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010199095(A) 申请公布日期 2010.09.09
申请号 JP20100136184 申请日期 2010.06.15
申请人 SONY CORP 发明人 HIGO TOMOYUKI;MATSUO KEISUKE
分类号 H05B33/10;H01L51/50 主分类号 H05B33/10
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