| 摘要 |
<P>PROBLEM TO BE SOLVED: To inhibit generation of development spots by efficiently and smoothly performing operation which separates and collects first treatment liquid supplied to a substrate to be treated on a transfer line of flat flow and replaces the first treatment liquid with second treatment liquid. Ž<P>SOLUTION: A substrate processing apparatus comprises: a substrate transfer path 2 through which a substrate G to be treated is transferred so as to flow flatly; a first treatment liquid supply means 9 which supplies the first treatment liquid to the substrate to be treated which is transferred through the substrate transfer path; a gas supply means 21 which sprays predetermined gas flow, toward either vertical direction or transfer direction downstream side, on the substrate to be treated which is transferred through the substrate transfer path and to which the first treatment liquid is supplied; a first rinse means 22 which supplies the second treatment liquid, by a predetermined flow velocity, on the substrate to be treated on which the gas flow is sprayed by the gas supply means, and which is transferred through the substrate transfer path; and a second rinse means 23 which supplies the second treatment liquid, by a high flow velocity higher than that of the first rinse liquid supply means, on the substrate to be treated on which the second treatment liquid is supplied and which is transferred through the substrate transfer path. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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