| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device for observing defects capable of analyzing the arrangement and the hierarchical relationship of a circuit pattern formed using the design information of a sample, creating a non-defective image from a defective image based on the analysis results, and detecting the defects by comparison checking. <P>SOLUTION: The device for observing the defects includes a calculation unit 120 having the steps for input of the design information of the sample 106 of an object to be observed from a storage 114, for input of layer information observable preset to the sample of the object to be observed from the storage 114 based on the design information including one or more layers, for input of a defect coordinate on the sample detected by other inspection device from the storage 114, analyzing the structure of a circuit pattern on the peripheral region of the defect coordinate with respect to the defects on the sample 106 of the object based on the defect coordinate, based on the design and the layer information, estimating a non-defective image using the analysis results of the structure of the circuit pattern, and detecting the defects by the comparison inspection of image information from a non-defective image and an image acquisition unit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
