发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.
申请公布号 US2010225889(A1) 申请公布日期 2010.09.09
申请号 US20100720080 申请日期 2010.03.09
申请人 CANON KABUSHIKI KAISHA 发明人 SUMIYOSHI YUHEI
分类号 G03F7/207;G02B13/18;G03B27/52 主分类号 G03F7/207
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